濺射靶材
產(chǎn)品中心
鉻管靶材 Cr
鉻管靶可加工成熱等靜壓（HIP）整體成型鉻管靶和噴涂鉻管靶，兩種鉻管靶相比，熱等靜壓整體成型鉻管靶具有氧含量低、致密度高、鍍膜均勻致密質(zhì)量好等優(yōu)點，缺點成本較高。
所屬分類：
鉻管
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產(chǎn)品描述
鉻管靶可加工成熱等靜壓（HIP）整體成型鉻管靶和噴涂鉻管靶，兩種鉻管靶相比，熱等靜壓整體成型鉻管靶具有氧含量低、致密度高、鍍膜均勻致密質(zhì)量好等優(yōu)點，缺點成本較高。
Compared with the spraying chromium tube target, the integral forming chromium tube target by HIP has the advantages of low oxygen content, high density, uniform and compact coating and so on.
|
性能 Product performance |
噴涂鉻管靶材 Spraying chromium tube target |
熱等靜壓整體成形鉻管靶材 Integral forming chromium tube target by HIP |
|
氧含量/ppm Oxygen content |
≤5000 |
80-1500 |
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鍍膜均勻性 Deposition uniformity |
1.整管軸向致密度相差較大 2.整爐上中下L、A、B值相差較大 3.無法保證產(chǎn)品膜層的一致性 1.The density of the tube target along the axial is different. 2.The value of L, A and B is different in the whole furnace. 3.The consistency of the product film can not be guaranteed |
1.整管均勻性高 2.密度接近于純金屬熱擠壓密度，管材通體密度一致 3.無松散區(qū)、無暗區(qū) 4.PVD膜層的厚度及顏色的一致性好 5.整爐上中下L、A、B值統(tǒng)一性好 1.High uniformity of the whole tube 2.The density of the whole tube target is close to hot extrusion density and is consistent 3.No loose area and dark area 4.The consistency of the thickness and color of the PVD film is good 4.The values of L, A and B in the whole furnace are good. 5.The value of L, A and B is consistent in the whole furnace. |
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鍍膜電流密度 Deposition current density |
無法實現(xiàn)大電流長時間工作 Can not work for a long time at large current |
大功率長時間穩(wěn)定工作 Can steadily work for a long time under high power |
關(guān)鍵詞：
鉻靶材,鉻靶
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